JPH0426531U - - Google Patents

Info

Publication number
JPH0426531U
JPH0426531U JP6727990U JP6727990U JPH0426531U JP H0426531 U JPH0426531 U JP H0426531U JP 6727990 U JP6727990 U JP 6727990U JP 6727990 U JP6727990 U JP 6727990U JP H0426531 U JPH0426531 U JP H0426531U
Authority
JP
Japan
Prior art keywords
plasma
conduit
vacuum chamber
etching
etching apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6727990U
Other languages
English (en)
Japanese (ja)
Other versions
JP2545575Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1990067279U priority Critical patent/JP2545575Y2/ja
Publication of JPH0426531U publication Critical patent/JPH0426531U/ja
Application granted granted Critical
Publication of JP2545575Y2 publication Critical patent/JP2545575Y2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP1990067279U 1990-06-27 1990-06-27 エッチング装置 Expired - Fee Related JP2545575Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990067279U JP2545575Y2 (ja) 1990-06-27 1990-06-27 エッチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990067279U JP2545575Y2 (ja) 1990-06-27 1990-06-27 エッチング装置

Publications (2)

Publication Number Publication Date
JPH0426531U true JPH0426531U (en]) 1992-03-03
JP2545575Y2 JP2545575Y2 (ja) 1997-08-25

Family

ID=31600716

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990067279U Expired - Fee Related JP2545575Y2 (ja) 1990-06-27 1990-06-27 エッチング装置

Country Status (1)

Country Link
JP (1) JP2545575Y2 (en])

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62179117A (ja) * 1986-02-03 1987-08-06 Hitachi Ltd プラズマ処理装置
JPS63170938U (en]) * 1987-04-23 1988-11-07

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62179117A (ja) * 1986-02-03 1987-08-06 Hitachi Ltd プラズマ処理装置
JPS63170938U (en]) * 1987-04-23 1988-11-07

Also Published As

Publication number Publication date
JP2545575Y2 (ja) 1997-08-25

Similar Documents

Publication Publication Date Title
CA2102431A1 (en) Microelectrospray Method and Apparatus
AU3340497A (en) Pumping device by non-vaporisable getter and method for using this getter
NO20032177L (no) Ledningsrör for transport av dypkjölte medier
JPH0426531U (en])
JPS6418727U (en])
JPS6473725A (en) Etching device
JPH0256432U (en])
JPH0268435U (en])
JPS6228430U (en])
FR2812258B1 (fr) Servofrein pneumatique et procede de montage
JPS63170938U (en])
JPS58145549U (ja) プラズマ発光分析用ト−チ
SE8705053L (sv) Saett vid framstaellning av en roerformig pulverpresskropp samt en foer genomfoerande av saettet avsedd anordning
JPH0343231Y2 (en])
JPS63136327U (en])
JPH0246359U (en])
JPS6291433U (en])
JPS5680136A (en) Dry etching device
JPS57170535A (en) Etching method for thin silicon film
JPS6163833U (en])
JPS63136325U (en])
JPH01165627U (en])
JPS6451259U (en])
JPH022829U (en])
JPH01176925U (en])

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees